Del Mar Photonics - Newsletter

Sixth International Conference on Nanophotonics (ICNP)
27- 30 May 2012
Peking University | Beijing, China

Plenary Speakers
Thomas Ebbesen; University of Strasbourg, France
Satoshi Kawata; Osaka University, Japan
Paras Prasad; University at Buffalo, SUNY, USA
Xiang Zhang; University of California at Berkeley, USA

Invited Speakers
Kyungwon An; Seoul National University, Korea
Ben-Feng Bai; Tsinghua University, China
Oliver Benson; H-U Berlin, Germany
Che Ting Chan; HKUST, China
Zhanghai Chen; Fudan University, China
Yiping Cui; Southeast University, China
Qiaoqiang Gan; University at Buffalo, SUNY, USA
Harald Giessen; University of Stuttgart, Germany
Ying Gu; Peking University, China
K. Hakuta; The University of Electro-Communications, Japan
Ming-Hui Hong; National University of Singapore, Singapore
Chennupati Jagadish; Australian National University, Australia
Sanjay Krishna; University of New Mexico, USA
Zhi-Yuan LI; Chinese Academy of Sciences, China
Yan Li; Peking University, China
Stephan Link; Rice University, USA
Na Liu; Rice University, USA
Ai Qun Liu; Nanyang Technological University, Singapore
Olivier J. F. Martin; EPFL, Switzerland
Bumki Min; Kaist, Korea
Keitaro Nakatani; Ecole Nornale Superieure Cachan, France
Fiorenzo Omenetto; Tufts University, USA
Rupert Oulton; Imperial College, UK
Pascal Perriat; INSA de Lyon, France
Marco Rahm; University of Kaiserslautern, Germany
Marek Samoc; Wroclaw University of Technology, Poland
Charles Surya; Hong Kong Polytechnic University, China
Takuo Tanaka; RIKEN, Japan
Din Ping; Tsai National Taiwan University
Francisco J. García; Vidal Universidad Autonoma de Madrid, Spain
Frank Vollmer; Max Planck Institute, Germany
Vassilios Yannopapas; University of Patras, Greece
Ken-Tye Yong; Nanyang Technological University, Singapore
Nanfang Yu; Harvard University, USA
Edo Waks; University of Maryland, USA
Zheng Wang; UT Austin, USA
Chee Wei Wong; Columbia University, USA
Xuming Zhang; Hong Kong Polytechnic University, China
Nikolay Zheludev; University of Southampton, UK
Lei Zhou; Fudan University, China
Xing Zhu; Peking University, China


General Co-chairs
Qihuang Gong; Peking University, China
Joseph Haus; Univ. of Dayton, USA

Near Field Scanning Optical Microscope NSOM Godwit - best spatial optical resolution using the near field scanning optical microscope (NSOM) principle
Near field scanning optical microscope (NSOM) and atomic force microscope (AFM) modes of operation
NSOM images with laser and lamp illumination
Commerciaand custom NSOM probes
Near field optica and luminescence images in photon counting mode
NSOM images in collection and illumination modes
Transmission and reflection NSOM configurations
20 nm optical resolution (Raleigh criteria for spatial resolution)
State-of-the-art optical microscope console: simultaneous sample and tip observation with long working distance objectives
Femtosecond and UV excitation
True single molecule detection
High-resolution AFM imaging of DNA
Godwit-uScope data acquisition and Godwit-FemtoScan image processing software
Ambient light protection with light-tight box
 

 

 

Trestles LH10-fs/CW laser system at UC Santa Cruz Center of Nanoscale Optofluidics

Del Mar Photonics offers new Trestles fs/CW laser system which can be easily switched from femtosecond mode to CW and back. Having both modes of operation in one system dramatically increase a number of applications that the laser can be used for, and makes it an ideal tool for scientific lab involved in multiple research projects.
Kaelyn Leake is a PhD student in Electrical Engineering. She graduated from Sweet Briar College with a B.S. in Engineering Sciences and Physics. Her research interests include development of nanoscale optofluidic devices and their applications. Kaelyn is the recipient of a first-year QB3 Fellowship. In this video Kaelyn talks about her experimental research in nanoscale optofluidics to be done with Trestles LH laser.

Reserve a spot in our femtosecond Ti:Sapphire training workshop in San Diego, California during summer 2011


Frequency-stabilized CW single-frequency ring Dye laser DYE-SF-077 pumped by DPSS DMPLH laser installed in the brand new group of Dr. Dajun Wang at the The Chinese University of Hong Kong.
DYE-SF-077 features exceptionally narrow generation line width, which amounts to less than 100 kHz. DYE-SF-077 sets new standard for generation line width of commercial lasers. Prior to this model, the narrowest line-width of commercial dye lasers was as broad as 500 kHz - 1 MHz. It is necessary to note that the 100-kHz line-width is achieved in DYE-SF-077 without the use of an acousto-optical modulator, which, as a rule, complicates the design and introduces additional losses. A specially designed ultra-fast PZT is used for efficient suppression of radiation frequency fluctuations in a broad frequency range. DYE-SF-077 will be used in resaerch of Ultracold polar molecules, Bose-Einstein condensate and quantum degenerate Fermi gas and High resolution spectroscopy

630nm

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